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1、WAT 测量项目以及测试方法,2008/03/07,WAT 测量项目以及测试方法2008/03/07,WAT Introduction,WAT是什么WAT系统介绍3. WAT测试项目及方法,WAT IntroductionWAT是什么,Wafer Acceptance Test（晶片允收测试） 半导体硅片在完成所有制程工艺后，针对硅片上的各种测试结构所进行的电性测试。 通过对WAT数据的分析，我们可以发现半导体制程工艺中的问题，帮助制程工艺进行调整。,WAT是什么?,Wafer Acceptance Test（晶片允收测试）W,WAT系统介绍,Manual Prober,Agilent 428
2、4A CV Meter,Agilent 4156A IV Meter,Cascade Manual Prober,WAT系统介绍Manual ProberAgilent 42,WAT系统介绍,Agilent 4070 system,TEL P8XL,Agilent 4070,WAT系统介绍Agilent 4070 systemTEL,WAT系统介绍,HP 4070 Server,Agilent 81110A Pulse Generator,Agilent 4284A CV Meter,Agilent E4411B Spectrum Analyzer,Agilent 4070 内部结构,Agil
3、ent 3458ADigit Multimeter,WAT系统介绍HP 4070 ServerAgilent 8,WAT 流程图,WaferAuto-ProberRelay MetricSe,WAT测试项目,MOS deviceField DeviceJunctionGate OxideResistorBipolar DeviceLayout Rule Check,常见的几种器件结构,WAT测试项目MOS device常见的几种器件结构,MOS Device,MOS Device,WAT-测试项目方法课件,以 NMOS 为例：,Item nameMethod of measurement,2.
4、 Field Device,2. Field Device,WAT Item Name(以Poly Nfield为例) : VtNfpS (field Vt)IleakNfpSVptNfpS (punchthrough Vt),Item nameMethod of measurement,2022/11/4,14,可编辑,THANK YOUSUCCESS2022/10/91,3. Junction,3. Junction,WAT Item Name (以N+/PW junction为例) : CNjIleakNjBvNj,WAT Item Name (以N+/PW junctio,4. Gat
5、e Oxide,4. Gate Oxide,WAT Item Name(以PW gate oxide为例) : Cgpw ToxpwBvCgpw,NOTE: If there has a dummy capacitor, Cdummy should be subtracted.(Cox=Cox-Cdummy),WAT Item Name(以PW gate oxide为,5. Resistor,5. Resistor,Sheet resistance (RsN+/P+/NW/Poly/Metal),Item nameMethod of measurement,Contact Resistance
6、 (RcN+/P+/Via),Note: Rc need to subtract active & Metal resistor, RsMetal can be ignored due to metal resistor is very small.,Contact Resistance (RcN+/P+/Vi,6. Bipolar Device,6. Bipolar Device,WAT Item Name(以NPN为例): HfeNpn BvNpn,WAT Item Name(以NPN为例):Item nam,7. Layout Rule Check,7. Layout Rule Check,NW/N+ Poly/N+ active/Metal bridge,WAT Item Name(以NW bridge为例): IbriNW,PADPADNW/N+ Poly/N+ active/Met,Thanks!,Thanks!,2022/11/4,27,可编辑,THANK YOUSUCCESS2022/10/92,
