《原子层沉积Atomic Layer Depo课件.ppt》由会员分享，可在线阅读，更多相关《原子层沉积Atomic Layer Depo课件.ppt（16页珍藏版）》请在三一办公上搜索。
1、Atomic Layer Deposition (ALD),Synthetic Chemistry of Materials,Outline,Outline,1.Introduction to ALD2.Classical models: ALD of Al2O33.ALD and CVD4.Applications of ALD (1)Coatings on high aspect ratio structures (2)Coatings on Nanoparticles (3)Combination of CNT (4)Plasma ALD 5. Expectations and chal
2、lenge in ALD,2. Classical models: ALD of Al2O3,1. Introduction to ALD,Atomic layer deposition （ALD） atomic level control of film deposition,3. Comparison of ALD and CVD,Schematic pressure profile during the ALD and CVD process,Seung-Mo Lee et al., ChemPhysChem, 12, 791-798(2011),3. Comparison of ALD
3、 and CVD,1,2,M. Knaut, et al. Microelectron Eng, 107, 80-83 (2013),4.1 Coatings on high aspect ratio structures,4.2 Coatings on nanoparticles,Xu Dong Wang et al., Nano letters Vol.4,No.11 (2004),4.2 Coatings on nanoparticles,ALDCycles BowlThickness,PS Spheres Bowl Size,4.3 Combination of CNT and sup
4、er-black coatings,Schematic illustration of the ALD and CVD process for the synthesis of CNT arrays,Schematic representation of Al2O3 ALD coating on monodispersed NPs.,4.3 Combination of CNT and super-black coatings,Kai Zhou, et al., Nanoscale Res Lett, 5:1555-1560(2010) Xin Wang, et al., ACS Appl.
5、Mater. Interfaces,3: 4180-4184 (2011),4.4 Merits of Plasma-Assisted ALD,N. Leick, J. Vac. Sci. Technol. A 29, 021016 (2011),Merits,b. Direct plasma ALD,c. Remote plasma ALD,d. Direct plasma reactor with mesh,a. Radical-enhanced ALD,4.4 Plasma-Assisted ALD Configurations,Assisting an ALD process by m
6、eans of a plasma step:,Fig Various reactor configurations for plasma-assisted ALD,N. Leick, J. Vac. Sci. Technol. A 29, 021016 (2011),Steven M. George, Chemical Reviews,110,111-131( 2010),Challenges,Controlling the dosagesDifferent multi-metal deposition Different oxide doped deposition,DecomposingR
7、easonable vapor pressureReaction is between the precursors and the matrixes,Applied to the mass productionLow deposition rate100-300nm/h,5.1 Challenges of ALD,The future prospects for ALD are very promising. Various materials can be deposited using ALD techniques.,5.2 Expectations of ALD,Ideas worth spreading,Thank You,Merry Christmas!,
