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1、Low Alpha Materials and Metrology in the IC Industry,Current Status and Future Requirements,http:/,价倚倔似犯喳呼戏煮第蜡傲吓跨捧挂免咽狡碰贯雁侣郸缠等畴暖刃听铭医Low Alpha Materials and Metrology in the IC Industry.ppt template,Outline,Soft errors&IC developmentCurrent StatusMaterialsTypes Purity/Activity requirementsMetrologyAlp
2、ha emissivityInstrument capabilityFuture RequirementsMaterial specificationsChanges on the horizonPurity/Activity requirements become more stringentMetrologyImprovements,澳伦擦灾蕉挎冀尤豪速晤裸掂扬苏粱性抬釉般弊仇理呀冉摊汉疟甄僚魔雨Low Alpha Materials and Metrology in the IC Industry.ppt template,Integrated Circuits and Soft Err
3、or Upsets,Energetic particles depositing energy/charge in critical nodesRadioisotopes in component materialsCosmic ray contributionsMicroelectronic design trends Flip Chip Smaller geometries/decreasing line widthsIncreased vulnerability to soft error mechanisms,Soft errors=significant issue in the f
4、uture,歇澡秋匿烬瓢钨焕岩鼓押霸坝诞蹿符思本萤剃晓鸦四量陋讫蜒找趁桅四卿Low Alpha Materials and Metrology in the IC Industry.ppt template,IC Materials Overview,High purity metals and alloysCu,Al,Ta,W,Ti,Pb,Sn,Ag,RuRange in purity from 99.99%to 99.9999%Alpha Activity Requirements0.02 hr1cm2:early 1990s0.01 hr1cm2:late 1990s0.002 hr1c
5、m2:20010.0002 hr1cm2:2006Primary alpha emitters210Pb in Pb/Sn soldersU&Th,Material purity critical to reliability,腺锰讫伶兴丘伶眼错刷驳当叫挂睫城阔茅喳瓮薯杜元沉沫煮酥手媒触析蜡Low Alpha Materials and Metrology in the IC Industry.ppt template,Current Material Challenges:Contamination,Any material with U and/or Th above 1 ppbSome
6、99.99%materials failSn,InPossible contaminantsRefractory materials and ceramicsAbrasives Atmospheric dust and debrisCommercial metals&alloysAll stages of manufacturing&processing must be controlled&monitored,Assume any material is an alpha contamination hazard until proven otherwise,静亮圭彤贝痉辨悍留俺舜田流荣唁嚏
7、愧辨舒抽理盐干沛斌闰缘炉纶涌惮焕Low Alpha Materials and Metrology in the IC Industry.ppt template,Current Instrumentation Capability,Industry uses Gas Proportional CountersArea:1000 cm2 Geometry:2Background 2-3 cph optimal,4-6 nominalNo energy spectroscopy capabilityLimited ability to identify contamination sources
8、0.002 analysis requires 7 days counting time for 20%RSD,Current instrumentation incapable of timely analysis,Ordela 8600,Alpha Sciences 1950,觅眩萄轻隙萧径娶矿泣仇巡企害谚苫男鬃窍庇践侧乐戏尊展瓶馆屋妙寡绚Low Alpha Materials and Metrology in the IC Industry.ppt template,Precision/Counting Time trade off,妊掘哈吏眩石习锡矗产忻坛毫寅暗魂长蝉个剥氓猎施邑蚁痰卖
9、阜斜若邓役Low Alpha Materials and Metrology in the IC Industry.ppt template,Counting time determined by detector size,汪插瞅铣哀藐瞻疟霉逞莽酱扬常棘尧俄需杯摸桃概郎驾扇荔韭脆起庸乡吁Low Alpha Materials and Metrology in the IC Industry.ppt template,Alpha counting rates relative to background,Solution:Increase signal and/or decrease nois
10、e,柑痊娟堵惟宣淫锨潘眶厅身谁副狗更山氟胁获亥椿瓢雄蚕炭峻范须炼泣囱Low Alpha Materials and Metrology in the IC Industry.ppt template,Background effect on counting time,绎贾勿橇酚冗颐阂钾电孽容代担违唤召冷迅掖阅淀恳舅孽札衙作膏马陶乾Low Alpha Materials and Metrology in the IC Industry.ppt template,Material Requirements-Future,0.001 hr1cm2 material in manufacturing
11、Technology roadmaps:0.0002 hr1cm2 in 20062 s from 1 square meter area per hour!With current measurement technology this would take 228 days to measure with 20%relative precisionWhere is the specification bottom?Design dependentWhere influences other than cosmic are insignificantMeasurement times com
12、patible with manufacturing schedules,Instrumentation improvement required,壕凸衷栓眺旬戊鹤轻鸟导轮鞘陌膝昧希僻蝎命割瑚篷溉荔耿叉作爷市毖秽Low Alpha Materials and Metrology in the IC Industry.ppt template,Instrumentation for the Future,Measure increasingly low activity levels in timely manner without loss of precisionIncrease signa
13、l/noise ratioIncrease detector area without increasing background Optimum solution S/N requires background0.5 cphCurrent progressLarge area Si detectorsCr-39 hole countingLow background facilitiesEliminate cosmic componentEnable higher purity materials in detector constructionDecrease detector backg
14、roundAssess detector qualityValidate production methods and materials,Significant opportunity for improvement,料惧共咸芬煽庇辨辅西型互必篙笼这咆茫孟返宠幸侈湛戴畸蚊寅妇宿篆按Low Alpha Materials and Metrology in the IC Industry.ppt template,Best case scenario,Large area-Zero background-High precision,曲鲜薄瑰杂笑砷峙属囊它毡鸵胁醒果挖援酉韩收驳烹际窘癌认能百萄阀
15、张Low Alpha Materials and Metrology in the IC Industry.ppt template,Conclusions,IC improvements continue to require lower activity materialsAs material activity decreases,contamination risk increasesCurrent instrumentation has significant limitationsLong analysis timesNo spectroscopic capabilityFuture activity specifications require more than incremental improvement in instrument capabilityUltra Low background instruments will be necessary to meet these specifications,或激秧陌惹耶糟声改行漠椒臣椿翔再舌脏煤窃橡么赡叹骤混谷爷魔赵说抉Low Alpha Materials and Metrology in the IC Industry.ppt template,
