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1、半导体界统计和R的应用,中芯国际 良率管理系统2008-12-13,Content,Background R Usage at SMIC,Integrated Circuit(IC)Manufacturing,1.IC Design,3.Fabricated Wafers,Semiconductor Data Flow,WAT,FT,WS/CP,WIP(MES,iEMS),Wafer start,Fab out,Continually Defect inspection and review:inspection tool KLA,compass)review tool:SEM Leica(O
2、M),Continually ADI,AEI,CD,etc measurement called metrology(MES),MET,Defect(KLARF),WIP,EQ logdata,Test data,Process data,Also reliability,memory bit,QC and other data,Statisticians at SMIC,Reliability Analysis,Price,Time to Market,Original Yield Ramp,Our Mission:,Yield Analysis,R Usage at SMIC,1、线性模型
3、/非线性模型/广义线性模型Linear model for inline monitor Basic mixed effect model applied to semiconductor dataVarious correlation analyses2、统计图形：阐述清楚统计原理与图形元素的对应关系Useful and interesting plots:histogram w/splits,plot w/table(Excel like),wafer map(3-D)3、非参数统计：各种基于秩的检验以及光滑方法Smooth spline usage,EWMA Control Chart5
4、、多元统计：一方面展示已有方法的应用，如主成分、聚类等，另一方面体现出R在矩阵运算方面的简便Wafer pattern classification:clustering analysis7、数据挖掘和机器学习:Logistic回归、kNN、以及神经网络、SVM等Logistic regression application9、程序接口：C/Fortran/C+/Java等或者R(D)COM、RservePython/VB/Delphi/mySQL linking with RR(D)COM under study,Climb the Mountain Peak of R,Fighting!,
5、Thank you 谢谢,Q&A 请您提问,Linear Model for Inline Monitor,Inline analysis objectives Automatically examine ALL metrology items Alarm only significant trends and related equipment,WAT Uniformity Analysis(Mixed Effects Model Example),Problem Description:Break WAT parameters variation into lot,wafer Highli
6、ght large or increasing variance contributors to better control the manufacturing process.,i:lot number 1,2,a;j:wafer number 1,2,b;k:site number 1,2,n.,Reference Book:Mixed Effects Models in S and S-Plus.,Analysis Method:Mixed Effects Model:three-level nested linear model;Applied areas:agriculture,b
7、iology,economics,manufacturing&geophysics Using R(nlme),lot,wafer&die variance components are estimated.,WAT Uniformity Analysis Example Result,Other Correlation Analyses,Equipment Comparison,Queue Time,Interesting Plot 1,Histogram plot,Interesting Plot 2,Wafer Map,Smooth Spline Usage,Split,Reduce n
8、oise,Split control limitSmooth spline simulates the data for reducing noise,EWMA Control Chart,The Purpose of EWMA Control Chart:Detect data trend shift;Reduce SPC X-bar charts excursion false alarm rate.,Cluster Analysis,Used“neural network like”methods,Illustrations for Single Wafer Analysis,Proce
9、dure Interface/Data Preparation,Procedure Interface:Python(Perl)/VB/Delphi/mySQL linking with R.(Studying)Data Convert:Common use：reshape,merge,sort/order,apply,as.POSIXct.Purpose：match the format of SMIC data analysis systems.Data Clean:Wipe off the influential point,missing data.Purpose：prevent“Garbage In,Garbage out”.,
